Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device
US8313892B2 · kind B2 · utility
2Cited by
11References
8Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 7, 2005 |
| Grant date | Nov 20, 2012 |
| Priority date | — |
| Expiry date | Jan 17, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/095
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Technologies to form fine resist patterns consistently by solving the problem of poor patterning influenced by a resist-protecting film, are provided. A layer made of a resist (resist layer) is formed on a substrate, a resist-protecting film comprising an antistatic resin and a photo-acid generating agent is formed on the resist layer, and active-energy rays are selectively irradiated over the resist-protecting film, so that a resist pattern is formed by developing the resist.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.