Junichi Kon
33Patents
5h-index
21Co-inventors
69Inventor score
Filing activity: Apr 9, 1999 → Jul 2, 2018
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7338750B2 | Resist pattern thickness reducing material, resist pattern and process for forming thereof, and semiconductor device and process for manufacturing thereof | Physics | 20 | Expired |
| US6506534B1 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices | Emerging Cross-Sectional Technologies | 16 | Expired |
| US6844135B2 | Chemically amplified resist material and patterning method using same | Emerging Cross-Sectional Technologies | 13 | Expired |
| US8334091B2 | Resist pattern swelling material, and method for patterning using same | Physics | 6 | Active |
| US7189783B2 | Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof | Physics | 5 | Expired |
| US7465527B2 | Resist material, resist pattern and forming method for the same, and a semiconductor device and manufacturing method for the same | Emerging Cross-Sectional Technologies | 5 | Expired |
| US7220628B2 | Semiconductor device and manufacturing method thereof, and gate electrode and manufacturing method thereof | Electricity | 3 | Expired |
| US6773867B2 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices | Emerging Cross-Sectional Technologies | 3 | Expired |
| US7744768B2 | Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof | Physics | 2 | Active |
| US6794113B2 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices | Emerging Cross-Sectional Technologies | 2 | Expired |
| US8860211B2 | Semiconductor device, semiconductor device manufacturing method, and electronic device | Electricity | 2 | Active |
| US6465137B2 | Resist composition and pattern forming process | Physics | 2 | Expired |
| US6794112B2 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices | Emerging Cross-Sectional Technologies | 2 | Expired |
| US8313892B2 | Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device | Physics | 2 | Expired |
| US8349542B2 | Manufacturing process of semiconductor device | Physics | 1 | Active |
| US6787288B2 | Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices | Emerging Cross-Sectional Technologies | 1 | Expired |
| US7830013B2 | Material for forming adhesion reinforcing layer, adhesion reinforcing layer, semiconductor device, and manufacturing method thereof | Electricity | 1 | Active |
| US10236319B2 | Photodetector and imaging device | Electricity | 1 | Active |
| US6340772B1 | Process for preparing (hetero) aromatic substituted benzene derivatives | Chemistry; Metallurgy | 1 | Expired |
| US9354517B2 | Resist composition and method for forming pattern | Physics | 0 | Active |
| US8759161B2 | Surface coating method, semiconductor device, and circuit board package | Electricity | 0 | Active |
| US7364829B2 | Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device | Emerging Cross-Sectional Technologies | 0 | Expired |
| US8795951B2 | Material for forming resist sensitization film and production method of semiconductor device | Physics | 0 | Active |
| US8940622B2 | Method for manufacturing compound semiconductor device and detergent | Electricity | 0 | Active |
| US8815017B2 | Method of manufacturing semiconductor device and method of cleaning semiconductor substrate | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.