Defect classification with optimized purity
US8315453B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 27, 2010 |
| Grant date | Nov 20, 2012 |
| Priority date | — |
| Expiry date | Jul 27, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F18/254
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for defect analysis includes identifying single-class classifiers for a plurality of defect classes, the plurality of defect classes characterized by respective ranges of inspection parameter values. Each single-class classifier is configured for a respective class to identify defects belonging to the respective class based on the inspection parameter values, while identifying the defects not in the respective class as unknown defects. A multi-class classifier is identified that is configured to assign each defect to one of the plurality of the defect classes based on the inspection parameter values. Inspection data is received, and both the single-class and multi-class classifiers are applied to the inspection data to assign the defect to one of the defect classes.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.