Patent · US Active

Determining a repairing form of a defect at or close to an edge of a substrate of a photo mask

US8316698B2 · kind B2 · utility

2Cited by

2References

18Claims

0Family size

Assignee

NaWoTec GmbH · DE

Inventor

Michael Budach · Hanau, DE

Key dates

Filing date	Dec 17, 2009
Grant date	Nov 27, 2012
Priority date	—
Expiry date	Jan 16, 2031

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10T29/49718
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

Determining a repairing form of a defect at or close to an edge of a substrate. The defect may be scanned with a scanning probe microscope to determine a three-dimensional contour of the defect. The defect may be scanned with a scanning particle microscope to determine the shape of the at least one edge of the substrate. The repairing form of the defect may be determined from a combination of the three-dimensional contour and the shape of the at least one edge.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.