Method and system for mask handling in high productivity chamber
US8317925B2 · kind B2 · utility
1Cited by
0References
19Claims
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Assignee
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Key dates
| Filing date | Jun 27, 2011 |
| Grant date | Nov 27, 2012 |
| Priority date | — |
| Expiry date | Jun 27, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S206/832
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A structure for independently supporting a wafer and a mask in a processing chamber is provided. The structure includes a set of extensions for supporting the wafer and a set of extensions supporting the mask. The set of extensions for the wafer and the set of extensions for the mask enable independent movement of the wafer and the mask. In one embodiment, the extensions are affixed to an annular ring which is capable of moving in a vertical direction within the processing chamber. A processing chamber, a mask, and a method for combinatorially processing a substrate are also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.