INTERMOLECULAR, INC.
🏢 View company profile →727Patents
727Active
727Granted
64Portfolio score
Filing activity: May 18, 2005 → Jan 7, 2020 · 103 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8440259B2 | Vapor based combinatorial processing | Chemistry; Metallurgy | 518 | Active |
| US8821985B2 | Method and apparatus for high-K gate performance improvement and combinatorial processing | Performing Operations; Transporting | 324 | Active |
| US9142764B1 | Methods of forming embedded resistors for resistive random access memory cells | Electricity | 324 | Active |
| US8900364B2 | High productivity vapor processing system | Chemistry; Metallurgy | 183 | Active |
| US8183553B2 | Resistive switching memory element including doped silicon electrode | Electricity | 127 | Active |
| US8144498B2 | Resistive-switching nonvolatile memory elements | Physics | 101 | Active |
| US7629198B2 | Methods for forming nonvolatile memory elements with resistive-switching metal oxides | Electricity | 98 | Active |
| US8945414B1 | Oxide removal by remote plasma treatment with fluorine and oxygen radicals | Electricity | 90 | Active |
| US7972897B2 | Methods for forming resistive switching memory elements | Electricity | 69 | Active |
| US7309658B2 | Molecular self-assembly in substrate processing | Emerging Cross-Sectional Technologies | 55 | Active |
| US8846484B2 | ReRAM stacks preparation by using single ALD or PVD chamber | Electricity | 40 | Active |
| US8294219B2 | Nonvolatile memory element including resistive switching metal oxide layers | Electricity | 31 | Active |
| US9012322B2 | Selective etching of copper and copper-barrier materials by an aqueous base solution with fluoride addition | Electricity | 30 | Active |
| US8277888B2 | Dual path gas distribution device | Emerging Cross-Sectional Technologies | 27 | Active |
| US9052456B2 | Low-E glazing performance by seed structure optimization | Emerging Cross-Sectional Technologies | 25 | Active |
| US8569104B2 | Transition metal oxide bilayers | Electricity | 25 | Active |
| US7544574B2 | Methods for discretized processing of regions of a substrate | Electricity | 24 | Active |
| US7678607B2 | Methods for forming resistive switching memory elements | Electricity | 23 | Active |
| US8466005B2 | Method for forming metal oxides and silicides in a memory device | Electricity | 23 | Active |
| US8072795B1 | Biploar resistive-switching memory with a single diode per memory cell | Physics | 23 | Active |
| US8686389B1 | Diffusion barrier layer for resistive random access memory cells | Electricity | 22 | Active |
| US8343813B2 | Resistive-switching memory elements having improved switching characteristics | Electricity | 21 | Active |
| US9246013B2 | IGZO devices with composite channel layers and methods for forming the same | Electricity | 21 | Active |
| US9315414B2 | Low-e panels with ternary metal oxide dielectric layer and method for forming the same | Chemistry; Metallurgy | 20 | Active |
| US9076523B2 | Methods of manufacturing embedded bipolar switching resistive memory | Physics | 20 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.