Patent · US Active

Salt and photoresist composition containing the same

US8318403B2 · kind B2 · utility

13Cited by
0References
10Claims
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Assignee

Inventors

Key dates

Filing dateMay 25, 2010
Grant dateNov 27, 2012
Priority date—
Expiry dateNov 6, 2030

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC07C2603/86
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

A salt represented by the formula (I-CC):

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.