Patent · US Active

Salt and photoresist composition containing the same

US8318404B2 · kind B2 · utility

0Cited by
2References
8Claims
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Assignee

Inventors

Key dates

Filing dateJun 9, 2010
Grant dateNov 27, 2012
Priority date—
Expiry dateAug 23, 2030

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC07C2603/74
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

A salt represented by the formula (a1):wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C4 perfluoroalkyl group,

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.