Patent · US Active

Method for electron beam induced deposition of conductive material

US8318593B2 · kind B2 · utility

0Cited by

2References

21Claims

0Family size

Assignee

Carl Zeiss SMS Ltd. · IL

Inventors

Nicole Auth · Gustavsburg, DE
Petra Spies · Mainz, DE
Rainer Becker · Pfungstadt, DE
Thorsten Hofmann · Rodgau, DE
Klaus Edinger · Lorsch, DE

Key dates

Filing date	Aug 7, 2009
Grant date	Nov 27, 2012
Priority date	—
Expiry date	Aug 7, 2029

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/76898
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

The invention relates to a method for electron beam induced deposition of electrically conductive material from a metal carbonyl with the method steps of providing at least one electron beam at a position of a substrate, storing at least one metal carbonyl at a first temperature, and heating the at least one metal carbonyl to at least one second temperature prior to the provision at the position at which the at least one electron beam impacts on the substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.