Klaus Edinger
31Patents
8h-index
36Co-inventors
75Inventor score
Filing activity: Jun 1, 2000 → Jun 10, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7238294B2 | Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface | Electricity | 45 | Expired |
| US7485873B2 | Ion sources, systems and methods | Electricity | 22 | Active |
| US8110814B2 | Ion sources, systems and methods | Electricity | 20 | Active |
| US7452477B2 | Procedure for etching of materials at the surface with focussed electron beam induced chemical reaction at said surface | Electricity | 20 | Expired |
| US8632687B2 | Method for electron beam induced etching of layers contaminated with gallium | Electricity | 14 | Active |
| US6518872B1 | High resolution scanning thermal probe and method of manufacturing thereof | Emerging Cross-Sectional Technologies | 9 | Expired |
| US7335942B2 | Field effect transistor sensor | Physics | 9 | Expired |
| US7537708B2 | Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface | Electricity | 8 | Active |
| US7232997B2 | Apparatus and method for investigating or modifying a surface with a beam of charged particles | Electricity | 8 | Expired |
| US6633711B1 | Focused ion-beam fabrication of fiber probes for use in near field scanning optical microscopy | Performing Operations; Transporting | 7 | Expired |
| US8247782B2 | Apparatus and method for investigating and/or modifying a sample | Electricity | 5 | Active |
| US7786403B2 | Method for high-resolution processing of thin layers using electron beams | Electricity | 3 | Active |
| US10060947B2 | Method and apparatus for analyzing and for removing a defect of an EUV photomask | Physics | 3 | Active |
| US9023666B2 | Method for electron beam induced etching | Electricity | 3 | Active |
| US8674329B2 | Method and apparatus for analyzing and/or repairing of an EUV mask defect | Physics | 3 | Active |
| US8748845B2 | Ion sources, systems and methods | Electricity | 2 | Active |
| US8769709B2 | Apparatus and method for analyzing and modifying a specimen surface | Physics | 2 | Active |
| US9186630B2 | Perforated membranes | Emerging Cross-Sectional Technologies | 2 | Active |
| US8623230B2 | Methods and systems for removing a material from a sample | Electricity | 2 | Active |
| US9910065B2 | Apparatus and method for examining a surface of a mask | Physics | 1 | Active |
| US9236225B2 | Ion sources, systems and methods | Electricity | 1 | Active |
| US9115981B2 | Apparatus and method for investigating an object | Electricity | 1 | Active |
| US10983075B2 | Device and method for analysing a defect of a photolithographic mask or of a wafer | Electricity | 1 | Active |
| US9012867B2 | Ion sources, systems and methods | Electricity | 1 | Active |
| US11733186B2 | Device and method for analyzing a defect of a photolithographic mask or of a wafer | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.