Devices for fabricating tri-layer beams
US8319312B2 · kind B2 · utility
4Cited by
2References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 23, 2008 |
| Grant date | Nov 27, 2012 |
| Priority date | — |
| Expiry date | Feb 28, 2031 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2203/0771
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Methods and devices for fabricating tri-layer beams are provided. In particular, disclosed are methods and structures that can be used for fabricating multilayer structures through the deposition and patterning of at least an insulation layer, a first metal layer, a beam oxide layer, a second metal layer, and an insulation balance layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.