Patent · US Active

Method for producing an electro-mechanical microsystem

US8324073B2 · kind B2 · utility

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1References

18Claims

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Assignee

Comissariat a l'Energie Atomique et aux Energies Alternatives · FR

Inventors

Frederic Gaillard · Grenoble, FR
Fabrice Nemouchi · Moirans, FR

Key dates

Filing date	Mar 10, 2011
Grant date	Dec 4, 2012
Priority date	—
Expiry date	Mar 10, 2031

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB81C2201/0115
WIPO fieldMicro-structural and nano-technology
WIPO sectorChemistry

Abstract

A method for producing an electro-mechanical microsystem including movable mechanical parts, said method including a phase of releasing at least one movable mechanical part, wherein the releasing phase includes the following steps: formation of at least one porous zone in a first wafer of a semiconductor material; formation of at least a pattern of a material that makes at least one movable mechanical part on a front face of the first wafer and at least a partial encapsulation of the pattern in a sacrificial layer; release of the movable mechanical part through a rear face of the first wafer throughout the porous zone, using a solvent of the sacrificial layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.