Fabrice Nemouchi
32Patents
3h-index
32Co-inventors
59Inventor score
Filing activity: Sep 29, 2008 → Oct 14, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8470689B2 | Method for forming a multilayer structure | Performing Operations; Transporting | 197 | Active |
| US7842612B2 | Selective formation of a compound comprising a semi-conducting material and a metallic material in a substrate through a germanium oxide layer | Electricity | 6 | Active |
| US8664104B2 | Method of producing a device with transistors strained by means of an external layer | Electricity | 3 | Active |
| US9269570B2 | Contact on a heterogeneous semiconductor substrate | Electricity | 3 | Active |
| US8617908B2 | Method for producing a substrate including a step of thinning with stop when a porous zone is detected | Electricity | 3 | Active |
| US8586463B2 | Method for preparing a layer comprising nickel monosilicide NiSi on a substrate comprising silicon | Electricity | 2 | Active |
| US7972911B1 | Method for forming metallic materials comprising semi-conductors | Electricity | 2 | Active |
| US10340361B2 | Forming of a MOS transistor based on a two-dimensional semiconductor material | Electricity | 1 | Active |
| US9093552B2 | Manufacturing method for a device with transistors strained by silicidation of source and drain zones | Electricity | 1 | Active |
| US11217446B2 | Method for fabricating an integrated circuit including a NMOS transistor and a PMOS transistor | Electricity | 1 | Active |
| US9548210B2 | Fabrication method of a transistor with improved field effect | Electricity | 1 | Active |
| US10930562B2 | Internal via with improved contact for upper semi-conductor layer of a 3D circuit | Electricity | 0 | Active |
| US11698488B2 | Method for fabricating a heterostructure comprising active or passive elementary structure made of III-V material on the surface of a silicon-based substrate | Electricity | 0 | Active |
| US11941485B2 | Method of making a quantum device | Physics | 0 | Active |
| US10388653B2 | Formation of Ohmic contacts for a device provided with a region made of III-V material and a region made of another semiconductor material | Electricity | 0 | Active |
| US12402542B2 | Josephson transistor | Electricity | 0 | Active |
| US11387147B2 | Method for producing a component by filling a cavity within an electrical isolation area with carbon-based material | Electricity | 0 | Active |
| US12417919B2 | Method for producing a superconducting vanadium silicide on a silicon layer | Electricity | 0 | Active |
| US11631739B2 | Transistor having blocks of source and drain silicides near the channel | Electricity | 0 | Active |
| US9831319B2 | Transistor with MIS connections and fabricating process | Electricity | 0 | Active |
| US11515148B2 | Method for producing at least one device in compressive strained semiconductor | Electricity | 0 | Active |
| US9379024B2 | Method for manufacturing a microelectronic device including depositing identical or different metallic layers on the same wafer | Electricity | 0 | Active |
| US12408405B2 | Device comprising spacers including a localised airgap and associated manufacturing methods | Electricity | 0 | Active |
| US10361087B2 | Process for producing an intermetallic contact based on Ni on InxGa1-xAs | Electricity | 0 | Active |
| US9997395B2 | Fabrication method of a stack of electronic devices | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.