Patent · US Active

System and method for evaluating error sources associated with a mask

US8327298B2 · kind B2 · utility

0Cited by

2References

24Claims

0Family size

Assignee

Applied Materials Israel Ltd. · IL

Inventors

Lev Faivishevsky · Kfar Sava, IL
Sergey Khristo · Ashdod, IL
Amir Sagiv · Mevaseret Tsiyon, IL
Shmuel Mangan · Rehovot, IL

Key dates

Filing date	Feb 25, 2010
Grant date	Dec 4, 2012
Priority date	—
Expiry date	Oct 21, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/84
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Evaluating error sources associated with a mask involves: (i) receiving data representative of multiple images of the mask that were obtained at different exposure conditions; (ii) calculating, for multiple sub-frames of each image of the mask, values of a function of intensities of pixels of each sub-frame to provide multiple calculated values; and (iii) detecting error sources in response to calculated values and in response to sensitivities of the function to each error source.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.