Actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern-forming method using the same
US8329379B2 · kind B2 · utility
5Cited by
11References
21Claims
0Family size
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Key dates
| Filing date | Mar 29, 2010 |
| Grant date | Dec 11, 2012 |
| Priority date | — |
| Expiry date | Jan 26, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0397
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Provided is an actinic ray-sensitive or radiation-sensitive resin composition, a resist film formed with the composition, and a pattern-forming method using the same. The actinic ray-sensitive or radiation-sensitive resin composition includes (P) a resin that contains the following repeating units (A), (B) and (C); and a solvent having a boiling temperature of 150° C. or less,
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.