Scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment
US8334510B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 2, 2009 |
| Grant date | Dec 18, 2012 |
| Priority date | — |
| Expiry date | Sep 20, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2808
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An interface, a scanning electron microscope and a method for observing an object that is positioned in a non-vacuum environment. The method includes: generating an electron beam in the vacuum environment; scanning a region of the object with the electron beam while the object is located below an object holder; wherein the scanning comprises allowing the electron beam to pass through an aperture of an aperture array, pass through an ultra thin membrane that seals the aperture, and pass through the object holder; wherein the ultra thin membrane withstands a pressure difference between the vacuum environment and the non-vacuum environment; and detecting particles generated in response to an interaction between the electron beam and the object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.