Resist composition, method of forming resist pattern, novel compound, and acid generator
US8338076B2 · kind B2 · utility
5Cited by
4References
24Claims
0Family size
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Key dates
| Filing date | Nov 25, 2009 |
| Grant date | Dec 25, 2012 |
| Priority date | — |
| Expiry date | Aug 16, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/2041
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) containing a compound having a cation moiety comprising a group represented by general formula (I) (in the formula, R5 represents an organic group having a carbonyl group, an ester bond or a sulfonyl group; and Q represents a divalent linking group).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.