Photoacid generators and photoresists comprising same
US8338077B2 · kind B2 · utility
2Cited by
0References
2Claims
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Assignee
Inventors
Key dates
| Filing date | Jun 22, 2010 |
| Grant date | Dec 25, 2012 |
| Priority date | — |
| Expiry date | Oct 5, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0397
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that comprise a multi cyclic lactone moiety.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.