Patent · US Active

Compositions and methods for forming electronic devices

US8338079B2 · kind B2 · utility

2Cited by

5References

11Claims

0Family size

Assignee

Rohm and Haas Electronic Materials LLC · US

Inventors

Young Cheol Bae · Weston, US
Thomas Cardolaccia · Natick, US
Yi-Chen Liu · Hsinchu, TW

Key dates

Filing date	Jun 28, 2010
Grant date	Dec 25, 2012
Priority date	—
Expiry date	Feb 24, 2031

Classification

Technology area (CPC H)Electricity
CPC primaryH01L2924/0002
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

Compositions are provided which can be used for treating photoresist patterns in the manufacture of electronic devices. The compositions allow for the formation of fine lithographic patterns and find particular applicability in semiconductor device manufacture.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.