Gluconic acid containing photoresist cleaning composition for multi-metal device processing
US8338350B2 · kind B2 · utility
2Cited by
17References
13Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 22, 2009 |
| Grant date | Dec 25, 2012 |
| Priority date | — |
| Expiry date | Jan 15, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/426
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A microelectronic photoresist cleaning composition suitable for cleaning multi-metal microelectronic devices and to do so without any substantial or significant galvanic corrosion occurring when there is a subsequent rinsing step employing water.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.