Overlay metrology target
US8345243B2 · kind B2 · utility
13Cited by
6References
2Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 4, 2010 |
| Grant date | Jan 1, 2013 |
| Priority date | — |
| Expiry date | Mar 4, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70633
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In one embodiment, a metrology target for determining a relative shift between two or more successive layers of a substrate may comprise; an first structure on a first layer of a substrate and an second structure on a successive layer to the first layer of the substrate arranged to determine relative shifts in alignment in both the x and y directions of the substrate by analyzing the first structure and second structure overlay.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.