Device structure including high-thermal-conductivity substrate
US8350295B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 13, 2008 |
| Grant date | Jan 8, 2013 |
| Priority date | — |
| Expiry date | May 22, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D62/85
Abstract
Methods and apparatuses for forming a device structure including a high-thermal-conductivity substrate are disclosed herein. A method forming such a device structure may comprise forming an active layer over a first substrate in a manner such that a frontside of the active layer faces the first substrate and a backside of the active layer faces away from the first substrate, forming a second substrate over the backside of the active layer, and removing the first substrate to expose the frontside of the active layer. Other embodiments are described and claimed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.