Method, device, and system for forming circular patterns on a surface
US8354207B2 · kind B2 · utility
18Cited by
15References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 26, 2011 |
| Grant date | Jan 15, 2013 |
| Priority date | — |
| Expiry date | Oct 26, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A stencil for character projection (CP) charged particle beam lithography and a method for manufacturing the stencil is disclosed, where the stencil contains two circular characters, where each character is capable of forming patterns on a surface in a range of sizes by using different dosages, and where the size ranges for the two characters is continuous. A method for forming circular patterns on a surface using variable-shaped beam (VSB) shots of different dosages is also disclosed. A method for forming circular patterns on a surface using a set of shots, where all of the shots comprise dosages, is also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.