Patent · US Active

Salt and photoresist composition containing the same

US8354217B2 · kind B2 · utility

8Cited by
1References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 25, 2010
Grant dateJan 15, 2013
Priority date—
Expiry dateNov 2, 2030

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/0397
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A salt represented by the formula (I-AA):

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.