Patent · US Active

Radio frequency power supply

US8357874B2 · kind B2 · utility

0Cited by

59References

20Claims

0Family size

Assignee

HUETTINGER Elektronik GmbH + Co. KG · DE

Inventors

Thomas Kirchmeier · Teningen, DE
Hans-Juergen Windisch · Ehrenkirchen, DE
Hanns-Joachim Knaus · Emmendingen, DE
Michael Glueck · Schreiber, CA

Key dates

Filing date	Jul 23, 2008
Grant date	Jan 22, 2013
Priority date	—
Expiry date	Aug 12, 2031

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02B20/00
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A plasma supply device includes a full bridge circuit that is connected to a DC power supply and that has two half bridges each with two series connected switching elements. The plasma supply device further includes a primary winding of a power transformer connected to centers of the half bridges between the switching elements. The primary winding includes a tapping connectable to an alternating current center between the potentials of the DC power supply.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.