Method of producing nanopatterned templates
US8361337B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 17, 2008 |
| Grant date | Jan 29, 2013 |
| Priority date | — |
| Expiry date | Jun 10, 2030 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01D2325/028
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
Nanopatterned substrates can be prepared by a method that includes forming a block copolymer film on a substrate, annealing the block copolymer film, surface reconstructing the annealed block copolymer film, coating an etch-resistant layer on the surface reconstructed block copolymer film, etching the resist-coated block copolymer film to create an etched article comprising a nanopatterned substrate, and separating the etch-resistant layer and the block copolymer film from the nanopatterned substrate. The method is applicable to a wide variety of substrate materials, avoids any requirement for complicated procedures to produce long-range order in the block copolymer film, and avoids any requirement for metal functionalization of the block copolymer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.