Radiation-sensitive composition and process for producing low-molecular compound for use therein
US8361691B2 · kind B2 · utility
1Cited by
8References
4Claims
0Family size
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Key dates
| Filing date | Aug 28, 2007 |
| Grant date | Jan 29, 2013 |
| Priority date | — |
| Expiry date | Oct 11, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0045
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.