Electrostatic chuck and apparatus having the same
US8363377B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 22, 2008 |
| Grant date | Jan 29, 2013 |
| Priority date | — |
| Expiry date | Sep 6, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67092
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
An electrostatic chuck and an apparatus having the electrostatic chuck are provided. The electrostatic chuck may attract a substrate during a substrate assembling process for manufacturing a flat display panel. An elastic layer made of an elastic material may be provided in a base part of the electrostatic chuck, thus preventing non-uniform stress from being distributed on the substrate due to external force, therefore maintaining the flatness of the substrate and improving the quality of assembled substrates. The electrostatic chuck may include an electrostatic force generating part provided on an upper surface of the base part, the force generating part including an insulating layer, an electrode layer, a dielectric layer. The base part may be provided with the elastic layer made of the elastic material having elastic restoring force.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.