Reflective mask blank, reflective mask, and method of manufacturing the same
US8367279B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 24, 2009 |
| Grant date | Feb 5, 2013 |
| Priority date | — |
| Expiry date | Jun 12, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/32
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A reflective mask blank includes a substrate, a multilayer reflective film formed on the substrate and having a structure in which a high refractive index layer and a low refractive index layer are alternately laminated, and an absorbing film stacked on the multilayer reflective film and adapted to absorb EUV exposure light. The absorbing film includes a phase shift layer adapted to give a predetermined phase difference to the EUV exposure light having passed therethrough and reflected by the multilayer reflective film with respect to the EUV exposure light directly incident on and reflected by the multilayer reflective film, and an absorber layer stacked on the phase shift layer and adapted to absorb and attenuate the EUV exposure light passing therethrough, either alone or jointly with the phase shift layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.