Patent · US Active

Salt and photoresist composition containing the same

US8367298B2 · kind B2 · utility

8Cited by
1References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJul 13, 2010
Grant dateFeb 5, 2013
Priority date—
Expiry dateApr 6, 2031

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F7/2041
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

A salt having a divalent group represented by the formula (aa):wherein Xa and Xb independently each represent —O— or —S—,

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.