Resist composition, method of forming resist pattern, compound and acid generator
US8367299B2 · kind B2 · utility
1Cited by
7References
15Claims
0Family size
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Key dates
| Filing date | Sep 15, 2011 |
| Grant date | Feb 5, 2013 |
| Priority date | — |
| Expiry date | Sep 15, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/122
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.