Method in depositing metal oxide materials
US8367561B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 2, 2008 |
| Grant date | Feb 5, 2013 |
| Priority date | — |
| Expiry date | Aug 14, 2029 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/405
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention relates to a method for enhancing uniformity of metal oxide coatings formed by Atomic Layer Deposition (ALD) or ALD-type processes. Layers are formed using alternating pulses of metal halide and oxygen-containing precursors, preferably water, and purging when necessary. An introduction of modificator pulses following the pulses of the oxygen-containing precursor affects positively on layer uniformity, which commonly exhibits gradients, particularly in applications with closely arranged substrates. In particular, improvement in layer thickness uniformity is obtained. According to the invention, alcohols having one to three carbon atoms can be used as the modificator.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.