Extensions of self-assembled structures to increased dimensions via a “bootstrap” self-templating method
US8372295B2 · kind B2 · utility
30Cited by
92References
28Claims
0Family size
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Key dates
| Filing date | Apr 20, 2007 |
| Grant date | Feb 12, 2013 |
| Priority date | — |
| Expiry date | Jul 26, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24612
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Methods for fabricating sublithographic, nanoscale arrays of openings and linear microchannels utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. Embodiments of the invention use a self-templating or multilayer approach to induce ordering of a self-assembling block copolymer film to an underlying base film to produce a multilayered film having an ordered array of nanostructures that can be removed to provide openings in the film which, in some embodiments, can be used as a template or mask to etch openings in an underlying material layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.