Reflective mask, reflective mask blank and method of manufacturing reflective mask
US8372564B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 27, 2009 |
| Grant date | Feb 12, 2013 |
| Priority date | — |
| Expiry date | Aug 16, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/24
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A reflective mask of this invention includes a multilayer reflective film (13), on a substrate (11), having a structure in which high refractive index layers and low refractive index layers are alternately laminated, and an absorbing film (15) stacked on the multilayer reflective film (13) and adapted to absorb EUV exposure light. The absorbing film (15) is a phase shift film that allows the EUV exposure light having passed therethrough and reflected by the multilayer reflective film to have a predetermined phase difference with respect to the EUV exposure light directly incident on and reflected by the multilayer reflective film. A plurality of the layers or all the layers of the multilayer reflective film (13) in a blind area are removed from its upper layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.