Quasi-annular reflective electron patterning device
US8373144B1 · kind B1 · utility
2Cited by
27References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 31, 2010 |
| Grant date | Feb 12, 2013 |
| Priority date | — |
| Expiry date | Aug 12, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/04
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
One embodiment relates to an electron-beam apparatus for writing a pattern on a target substrate. The apparatus includes a plurality of arrays of actively-controlled pixel elements at a surface of a reflective electron patterning device. The plurality of arrays of actively-controlled pixel elements are arranged so that there is an area without any actively-controlled pixel elements in a region surrounding an optical axis of the objective lens. The plurality of arrays may be arranged to each lie on a circle centered on the optical axis. Other features, aspects and embodiments are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.