Allen M. Carroll
11Patents
4h-index
17Co-inventors
57Inventor score
Filing activity: May 5, 1983 → Jun 5, 2014
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7369217B2 | Method and device for immersion lithography | Physics | 53 | Expired |
| US4498010A | Virtual addressing for E-beam lithography | Electricity | 44 | Expired |
| US4788431A | Specimen distance measuring system | Electricity | 12 | Expired |
| US8893059B2 | Pattern data system for high-performance maskless electron beam lithography | Electricity | 10 | Active |
| US6436607B1 | Border modification for proximity effect correction in lithography | Electricity | 4 | Expired |
| US7696498B2 | Electron beam lithography method and apparatus using a dynamically controlled photocathode | Electricity | 2 | Active |
| US8373144B1 | Quasi-annular reflective electron patterning device | Electricity | 2 | Active |
| US9214344B1 | Pillar-supported array of micro electron lenses | Emerging Cross-Sectional Technologies | 2 | Active |
| US9081287B2 | Methods of measuring overlay errors in area-imaging e-beam lithography | Electricity | 1 | Active |
| US9245714B2 | System and method for compressed data transmission in a maskless lithography system | Electricity | 0 | Active |
| US7958464B1 | Electron beam patterning | Performing Operations; Transporting | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.