Plasma lighting system
US8378582B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 10, 2011 |
| Grant date | Feb 19, 2013 |
| Priority date | — |
| Expiry date | Jun 30, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02B20/00
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma lighting system is disclosed. Interference with an electronic device using the same band as that of the plasma lighting system can be avoided by changing the shape of vanes constituting a magnetron, and a filament current of the magnetron at an initial starting stage and that in a normal state are adjusted to be different, thus avoiding interference with a wireless LAN and attenuating noise, and a resonator has a mash form to increase efficiency. Because a rectangular waveguide is bent substantially at a right angle, and the magnetron and the resonator are disposed at one side on the basis of a waveguide space of the waveguide, thus reducing the size and an installation space of the plasma lighting system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.