Patent · US Active

Method for providing alignment of a probe

US8378697B2 · kind B2 · utility

0Cited by
13References
32Claims
0Family size

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Key dates

Filing dateMar 25, 2011
Grant dateFeb 19, 2013
Priority date
Expiry dateMar 31, 2031

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/49222
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A method for aligning a probe relative to a supporting substrate defining a first planar surface, an edge, and a first crystal plane includes the steps of masking the surface of the substrate to define an exposed area on the first surface at the edge; and etching, using an etch reagent, a recess in the exposed area, the recess defining first and second opposed sidewalls, an end wall remote from the edge, and a bottom wall. The method further includes the step of providing a probe substrate defining a second planar surface and a second crystal plane identical to the first crystal plane, and positioning the probe substrate so that the first and the second crystal planes are positioned identically when forming a probe from the probe substrate using the etch reagent, wherein the probe defines congruent surfaces to the first and second sidewalls.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.