Charged particle beam deflection method with separate stage tracking and stage positional error signals
US8384048B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 25, 2008 |
| Grant date | Feb 26, 2013 |
| Priority date | — |
| Expiry date | Sep 20, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/30455
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention provides a method for patterning a resist coated substrate carried on a stage, where the patterning utilizes a charged particle beam. The method comprises the steps of: moving the stage at a nominally constant velocity in a first direction; while the stage is moving, deflecting the charged particle beam in the first direction to compensate for the movement of the stage, the deflecting including: (a) compensating for an average velocity of the stage; and (b) separately compensating for the difference between an instantaneous position of the stage and a calculated position based on the average velocity. The separately compensating step uses a bandwidth of less than 10 MHz. The invention also provides a deflector control circuit for implementing the separate compensation functions.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.