Multibeam Corporation
17Patents
16Active
17Granted
49Portfolio score
Filing activity: Apr 18, 2002 → Jul 27, 2015 · 4 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8384048B2 | Charged particle beam deflection method with separate stage tracking and stage positional error signals | Electricity | 49 | Active |
| US6777675B2 | Detector optics for electron beam inspection system | Electricity | 33 | Expired |
| US9478395B1 | Alignment and registration targets for multiple-column charged particle beam lithography and inspection | Electricity | 18 | Active |
| US7928404B2 | Variable-ratio double-deflection beam blanker | Electricity | 15 | Active |
| US9595419B1 | Alignment and registration targets for multiple-column charged particle beam lithography and inspection | Electricity | 15 | Active |
| US9466463B1 | Charged particle beam substrate inspection using both vector and raster scanning | Electricity | 15 | Active |
| US9556521B1 | Precision deposition using miniature-column charged particle beam arrays | Electricity | 13 | Active |
| US9620332B1 | Charged particle beam substrate inspection using both vector and raster scanning | Electricity | 12 | Active |
| US7941237B2 | Flat panel display substrate testing system | Physics | 12 | Active |
| US9207539B1 | Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems | Electricity | 12 | Active |
| US8999627B1 | Matched multiple charged particle beam systems for lithographic patterning, inspection, and accelerated yield ramp | Electricity | 11 | Active |
| US9466464B1 | Precision substrate material removal using miniature-column charged particle beam arrays | Electricity | 11 | Active |
| US9453281B1 | Precision deposition using miniature-column charged particle beam arrays | Electricity | 10 | Active |
| US8242457B2 | Charged particle optics with azimuthally-varying third-order aberrations for generation of shaped beams | Electricity | 10 | Active |
| US8999628B1 | Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems | Electricity | 10 | Active |
| US9673114B1 | Precision substrate material removal using miniature-column charged particle beam arrays | Electricity | 10 | Active |
| US9184027B1 | Matched multiple charged particle beam systems for lithographic patterning, inspection, and accelerated yield ramp | Electricity | 10 | Active |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.