Profiling solid state samples
US8389415B2 · kind B2 · utility
3Cited by
102References
23Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 23, 2010 |
| Grant date | Mar 5, 2013 |
| Priority date | — |
| Expiry date | Jun 4, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F39/8063
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
Methods and apparatus may operate to position a sample within a processing chamber and operate on a surface of the sample. Further activities may include creating a layer of reactive material in proximity with the surface, and exciting a portion of the layer of reactive material in proximity with the surface to form chemical radicals. Additional activities may include removing a portion of the material in proximity to the excited portion of the surface to a predetermined level, and continuing the creating, exciting and removing actions until at least one of a plurality of stop criteria occurs.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.