Optical imaging writer system
US8390781B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 5, 2010 |
| Grant date | Mar 5, 2013 |
| Priority date | — |
| Expiry date | Oct 13, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70508
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
System and method for applying mask data patterns to substrate in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system having a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, identifying objects in an area of the substrate to be imaged by corresponding SLMs, selecting evaluation points along edges of the objects, configuring the parallel imaging writer system to image the objects using the evaluations points, and performing multiple exposures to image the objects in the area of the substrate by controlling the plurality of SLMs to write the plurality of partitioned mask data patterns in parallel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.