Optical imaging writer system
US8390786B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 4, 2010 |
| Grant date | Mar 5, 2013 |
| Priority date | — |
| Expiry date | Sep 10, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70508
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
System and method for processing image data between adjacent imaging areas in a lithography manufacturing process are disclosed. In one embodiment, the method includes providing a parallel imaging writer system which has a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, receiving a mask data pattern to be written to a substrate, processing the mask data pattern to form a plurality of partitioned mask data patterns corresponding to different areas of the substrate, identifying an overlapping region between adjacent imaging areas to be imaged by corresponding SLMs, determining a stitching path for merging the adjacent imaging areas in the overlapping region in accordance with a set of predetermined cost functions, and controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the substrate in parallel using the stitching path.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.