Directed self-assembly of block copolymers using segmented prepatterns
US8398868B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 19, 2009 |
| Grant date | Mar 19, 2013 |
| Priority date | — |
| Expiry date | Jan 18, 2032 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2201/0149
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
An opening in a substrate is formed, e.g., using optical lithography, with the opening having sidewalls whose cross section is given by segments that are contoured and convex. The cross section of the opening may be given by overlapping circular regions, for example. The sidewalls adjoin at various points, where they define protrusions. A layer of polymer including a block copolymer is applied over the opening and the substrate, and allowed to self-assemble. Discrete, segregated domains form in the opening, which are removed to form holes, which can be transferred into the underlying substrate. The positions of these domains and their corresponding holes are directed to predetermined positions by the sidewalls and their associated protrusions. The distances separating these holes may be greater or less than what they would be if the block copolymer (and any additives) were to self-assemble in the absence of any sidewalls.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.