Patent · US Active

Tools, methods and devices for mitigating extreme ultraviolet optics contamination

US8399868B2 · kind B2 · utility

1Cited by

11References

20Claims

0Family size

Assignee

Sematech, Inc. · US

Inventors

Vibhu Jindal · Milpitas, US
Andrea Wüest · Zürich, CH

Key dates

Filing date	Feb 15, 2011
Grant date	Mar 19, 2013
Priority date	—
Expiry date	Feb 15, 2031

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70925
WIPO fieldMicro-structural and nano-technology
WIPO sectorChemistry

Abstract

Devices, tools, and methods for mitigating contamination of an optics surface used in extreme ultraviolet (EUV) applications disclosed. The method may include providing an optically reflective surface configured to reflect EUV radiation. The method may further include exposing the optically reflective surface to EUV radiation thereby generating electrons. The method may also include applying an electromagnetic field to the optically reflective surface, the electromagnetic field configured to reduce reactions initiated by the electrons on the optically reflective surface. The applied electromagnetic field may be constant or varied and also may have different biases.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.