Dual path gas distribution device
US8402845B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 28, 2012 |
| Grant date | Mar 26, 2013 |
| Priority date | — |
| Expiry date | Aug 28, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/0318
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for deploying two fluids separately into a reaction chamber is provided. The apparatus includes a first distribution network that is formed on a plate having a distribution face and a dispensing face. The first distribution network is defined by a plurality of recessed channels on the distribution face. The plurality of recessed channels includes a plurality of thru-ports that extend from the plurality of recessed channels to the dispensing face. The apparatus further includes a second distribution network that has passages formed below the plurality of recessed channels and above the dispensing face. A first set of ports extends from the passages to the distribution face and a second set of ports extends from a top surface of the distribution face to the dispensing face.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.