Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces
US8404124B2 · kind B2 · utility
25Cited by
91References
22Claims
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Key dates
| Filing date | Jun 12, 2007 |
| Grant date | Mar 26, 2013 |
| Priority date | — |
| Expiry date | Oct 13, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2438
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Methods for fabricating sublithographic, nanoscale microstructures arrays including openings and linear microchannels utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. In some embodiments, the films can be used as a template or mask to etch openings in an underlying material layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.