Method for correcting optical proximity effects
US8405907B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 12, 2011 |
| Grant date | Mar 26, 2013 |
| Priority date | — |
| Expiry date | Sep 12, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70308
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A system and associated method employ a first projection objective including at least one optical proximity correction (OPC) filter with a filter function adapted to a particular pattern. The first projection objective has at least essentially the same imaging properties as a second projection objective in the system, for the particular pattern, to which the filter function of the optical proximity correction (OPC) filter is adapted. The first projection objective differs from the second projection objective with respect to optical imaging properties for the particular pattern when the optical proximity correction (OPC) filter is not present in the first projection objective.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.