Method and system for context-specific mask inspection
US8407627B2 · kind B2 · utility
5Cited by
41References
36Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 8, 2007 |
| Grant date | Mar 26, 2013 |
| Priority date | — |
| Expiry date | Nov 7, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/84
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method for inspecting lithography masks includes generating integrated circuit design data and using context information from the integrated circuit design data to inspect a mask.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.