Modeling and cross correlation of design predicted criticalities for optimization of semiconductor manufacturing
US8407630B1 · kind B1 · utility
10Cited by
8References
20Claims
0Family size
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Key dates
| Filing date | Dec 22, 2009 |
| Grant date | Mar 26, 2013 |
| Priority date | — |
| Expiry date | Jul 29, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/33
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for modeling and cross correlation of design predicted criticalities include a feedback loop where information from the manufacturing process is provided to cross correlation engine for optimization of semiconductor manufacturing. The information may include parametric information, functional information, and hot spots determination. The sharing of information allows for design intent to be reflected in manufacturing metrology space; thus, allowing for more intelligent metrology and reduces cycle time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.